Publications: Process Variations |
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| All Years There are 8 entries in this category.
| LER-induced limitations to VDD scalability of FinFET-based SRAMs with different design options. | E. Baravelli, L. De Marchi, N. Speciale | 2009 | | - Proc. ESSDERC |
| | Correlation of fin shape fluctuations to FinFET electrical variability and noise margins of 6-T SRAM. | E. Baravelli, L. De Marchi, M. Jurczak, N. Speciale | 2009 | | - Proc. ULIS |
| | Fin-shape fluctuations in FinFET: Correlation to electrical variability and impact on 6-T SRAM noise margins. | E. Baravelli, L. De Marchi, N. Speciale | 2009 | | - Solid-State Electronics | | | Impact of LER and Random Dopant Fluctuations on FinFET Matching Performance. | E. Baravelli, M. Jurczak, N. Speciale, K. De Meyer, A. Dixit | 2008 | | - IEEE Trans. Nanotechnology |
| | TCAD modeling and characterization of short-range variations in multiple-gate devices and circuit blocks. | E. Baravelli, N. Speciale, A. Dixit, M. Jurczak | 2008 | | - Proc. MIXDES | | | Impact of LER and Random Dopant Fluctuations on FinFET Matching Performance. | E. Baravelli, M. Jurczak, N. Speciale, K. De Meyer, A. Dixit | 2007 | | - Silicon Nanoelectronics Workshop |
| | Impact of Line-Edge Roughness on FinFET Matching Performance. | E. Baravelli, A. Dixit, R. Rooyackers, M. Jurczak, N. Speciale, K. De Meyer | 2007 | | - IEEE Trans. Electron Devices |
| | Impact of Stochastic Mismatch on Measured SRAM Performance of FinFETs with Resist/Spacer-Defined Fins: Role of Line-Edge-Roughness. | A. Dixit, K. G. Anil, E. Baravelli, P. Roussel, A. Mercha, C. Gustin, M. Bamal, E. Grossar, R. Rooyackers, E. Augendre, M. Jurczak, S. Biesemans, K. De Meyer | 2006 | | - IEDM Tech. Dig. |
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